World’s most versatile and powerful analytical FEG SEM for both high and low-vacuum operations
Unique Wide Field Optics™ design with a proprietary Intermediate Lens (IML) offering a variety of working and displaying modes, for enhanced field of view or depth of focus, etc.
Real-time In-Flight Beam Tracing™ for performance and beam optimisation, which also allows direct and continuous control of the beam and beam current Beam Deceleration Technology (BDT) for excellent resolution at low beam voltages
High relolution Eectron Beam Lithography (EBL) platform able to creat sub-10nm features with highly complex structures using the powerful TESCAN DrawBeam software
Electron Channelling Pattern aquisition on polycrystalline maerials with just one click column setup
Beam Deceleration Technology and InBeam detectors allow imaging under extreley low energy and current beam for high resolution and surface sensitive imaging