Solaris X
EBSDEDSElectron Beam Lithography (EBL)Electron MicroscopyFabricationFIBMicroscopySEMTEMWDS
Solaris X
Xe plasma FIB-SEM for Semiconductors
Xe plasma FIB-SEM for Semiconductors
A stable heating module capable of temperatures up to 1500°C for a range of in situ SEM studies with gas capable micro-environments enabled
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Key Features
- Variable temperature - The heating module is capable of temperatures ranging from room temperature to 1500°C using a PID
- Stable - Temperature stability of 1°C, maximum heating ramp rate of 5°C/s and the flexibility of choosing either ramp rate or step wise increments across the entire temperature range
- Gaseous environments - Capable of creating micro-environments by admitting gases (NO Oxygen, NO Water) into the sub-chamber of the heating module and, with the motorised lid, can seal off the sample from the SEM chamber while heating
- Versatile - A range of heating modules are available with maximum temperatures of either 300°C, 800°C, 1050°C or 1500°C
- All
- AFM/SPM/SNOM
- CL
- CLEM
- Computed Tomography
- EBSD
- EDS
- Electron Beam Lithography (EBL)
- Electron Microscopy
- Fabrication
- FIB
- Hyperspectral
- In situ
- Micro XRD
- Micro XRF
- Microscopy
- Raman
- SEM
- Spectroscopy
- TEM
- Thermal Probe Lithography
- WDS
- X-ray Imaging
- X-ray Microscopy
