Solaris X
EBSDEDSElectron Beam Lithography (EBL)Electron MicroscopyFabricationFIBMicroscopySEMTEMWDS
Solaris X
Xe plasma FIB-SEM for Semiconductors
Xe plasma FIB-SEM for Semiconductors
An easy-to-use EBIC and RCI nanoprobing analysis tool which is compatible with most commercially available SEM’s and FIB’s making it the ideal choice for circuit testing and probing.
-
Key Features
- Two MM3E micromanipulators, at least one of which is equipped with a low-current measurement kit (LCMK-EM) and a signal amplifier.
- Recorded signals are amplified and fed back to the microscope thus generating a greyscale map of current in the scanned area. This eliminates the need for additional scan generators and greatly enhances the system's ease-of-use. The acquired data can be overlayed with the imagery generated by the SEM's detectors.
- Primary applications are open detection in integrated circuits, visualisation of p-n junctions and localisation of resistivity changes in via chains. Though mainly used for semiconductor failure analysis, this tool can be used for any application that requires accurate measurement of low currents.
- All
- AFM/SPM/SNOM
- CL
- CLEM
- Computed Tomography
- EBSD
- EDS
- Electron Beam Lithography (EBL)
- Electron Microscopy
- Fabrication
- FIB
- Hyperspectral
- In situ
- Micro XRD
- Micro XRF
- Microscopy
- Raman
- SEM
- Spectroscopy
- TEM
- Thermal Probe Lithography
- WDS
- X-ray Imaging
- X-ray Microscopy
