
TESCAN SOLARIS X
EBSDEDSElectron Beam Lithography (EBL)Electron MicroscopyFabricationFIBMicroscopySEMTEMWDS
One of the best
With rise time values <100 picoseconds, this beam blanker is ideally suited to the fast stroboscopic imaging required in voltage contrast, EBIC, OBIC, time-resolved cathodoluminescence and electron-beam lithography