Electrostatic Beam Blanker

One of the best

With rise time values <100 picoseconds, this beam blanker is ideally suited to the fast stroboscopic imaging required in voltage contrast, EBIC, OBIC, time-resolved cathodoluminescence and electron-beam lithography

  • Key Features

    • Speed - This beam blanker has been optimised to achieve the shortest possible "rise time" values and is the result of several years of development. A guarantee of 100 picoseconds rise time is included however data has shown figures between 35 to 50 picoseconds is consistently measured
    • Pulse distortions - Assuming good input pulses, pulse frequencies up to the GHz range have been found to be clean and square. With very short plates (5.5 mm), and only 5 V input pulses required to sufficiently blank a 40 KeV beam, flying-time effects are below the level of any detection method
    • Flexible - Able to be fitted to almost any SEM on the market with custom adaptation kits available if required.
  • All
  • AFM/SPM/SNOM
  • CL
  • CLEM
  • EBSD
  • EDS
  • Electron Beam Lithography (EBL)
  • Electron Microscopy
  • Fabrication
  • FIB
  • Hyperspectral
  • In situ
  • Micro XRD
  • Micro XRF
  • Microscopy
  • Raman
  • SEM
  • Spectroscopy
  • TEM
  • Thermal Probe Lithography
  • WDS