Crystal defect analysis of a single crystal substrate by X-ray reflection topography
Crystal defects in epitaxial thin films may cause problems when producing high-performance semiconductor devices. Epitaxial thin films may inherit crystal defects from the single crystal substrate. It is important to evaluate the grains and crystal defects of the single crystal substrate before film growth on it. X-ray topography is an XRD imaging technique used to observe crystal defect distribution in a single crystal substrate. The SmartLab automated multipurpose X-ray diffractometer, equipped with an XSight™ Micron FC high-sensitivity X-ray CCD camera, is capable of obtaining high-resolution topographs like those measured with dedicated equipment.