Metrology module for Hirox Digital Microscope – a complete inspection and measurement solution

NanoOne high throughput 3D printer with sub-micron resolution

The pinnacle instrument for X-ray materials analysis

Highest quality TEM lamellae preparation and superior analytical performance

Xe plasma FIB-SEM for Semiconductors

X-ray Absorption Spectroscopy (XAS)

Completely configurable, the QM comprises a laser source (EUV and/or VUV), amplifier, beamline tailored to the user’s experiment, and imaging or other analysis workstations that can effectively cover the microscopy/spectroscopy landscape for nano-to-quantum materials

A bench top source for EUV and soft X-rays

RAEA is KMLabs' sub-25 fs, single-box amplifier. It is a fully engineered and integrated commercial source based on a single rugged optomechanical platform with a unique software-tunable repetition rate in order to maximise experiment flexibility

The E5AT stage is a five-axis positioning tool especially designed to allow tilting samples to ±90 deg while allowing unlimited rotation of the sample and keeping the area of interest at the eucentric position.

Cleans specimens and holders immediately before insertion into an electron microscope; removes existing carbonaceous debris from the specimen and prevents contamination during imaging and analysis

The most versatile and universal analytical Ga FIB-SEM platform on the market

The most modern Xe plasma FIB SEM

Synchrotron level SAXS performance at your fingertips

Adding capabilities from in situ lift-out, electrical probing (FA)and nano-manipulation, the encoded MM3E micro-manipulator brings new functionality to your SEM or FIB/SEM instrument

The combination of Atomic Force Microscopy (AFM) and Scanning Electron Microscopes (SEM) opens the possibility of combining information on lateral dimensions and material from SEM inspection that can be readily complemented by precise topographical and force information in situ